Particle and Aerosol Research
Vol. 6, No. 3, September 2010
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ISSN : 1738-8716 (Print)
ISSN : 2287-8130 (Online)
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Real-time Contaminant Particle Monitoring for Chemical Vapor
Deposition of Borophosphosilicate and Phosphosilicate Glass Film
by using In-situ Particle Monitor and Particle Beam Mass Spectrometer
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Abstracts
In this study, we investigated the particle formation during the deposition of borophosphosilicate glass (BPSG) and
phosphosilicate glass (PSG) films in thermal chemical vapor deposition reactor using in-situ particle monitor (ISPM)
and particle beam mass spectrometer (PBMS) which installed in the reactor exhaust line. The particle current and number
count are monitored at set-up, stabilize, deposition, purge and pumping process step in real-time. The particle number
distribution at stabilize step was measured using PBMS and compared with SEM image data. The PBMS and SEM
analysis data shows the 110 nm and 80 nm of mode diameter for BPSG and PSG process, respectively.
Keywords£ºPBMS (particle beam mass spectrometer), ISPM (in-situ particle monitor), BPSG (borophosphosilicate
glass), PSG (phosphosilicate glass)